Ion implantation in silicon to facilitate testing of photonic circuits

• Main Authors: Reed, Graham T., Milosevic, Milan M., Chen, Xia, Cao, Wei, Littlejohns, Callum George, Wang, Hong, Khokhar, Ali Z., Thomson, David J.
• Other Authors: Eldada, Louay A.
• Format: Article
• Language: English
• Published: 2019
• Subjects: Engineering::Electrical and electronic engineering; Grating Couplers; Ion Implantation
• Online Access: https://hdl.handle.net/10356/106808; http://hdl.handle.net/10220/49652; http://dx.doi.org/10.1117/12.2252770
• Institution: Nanyang Technological University

In recent years, we have presented results on the development of erasable gratings in silicon to facilitate wafer scale testing of photonics circuits via ion implantation of germanium. Similar technology can be employed to develop a range of optical devices that are reported in this paper. Ion impla...