Ion implantation in silicon to facilitate testing of photonic circuits

In recent years, we have presented results on the development of erasable gratings in silicon to facilitate wafer scale testing of photonics circuits via ion implantation of germanium. Similar technology can be employed to develop a range of optical devices that are reported in this paper. Ion impla...

Full description

Saved in:
Bibliographic Details
Main Authors: Reed, Graham T., Milosevic, Milan M., Chen, Xia, Cao, Wei, Littlejohns, Callum George, Wang, Hong, Khokhar, Ali Z., Thomson, David J.
Other Authors: Eldada, Louay A.
Format: Article
Language:English
Published: 2019
Subjects:
Online Access:https://hdl.handle.net/10356/106808
http://hdl.handle.net/10220/49652
http://dx.doi.org/10.1117/12.2252770
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Language: English
id sg-ntu-dr.10356-106808
record_format dspace
spelling sg-ntu-dr.10356-1068082019-12-06T22:18:50Z Ion implantation in silicon to facilitate testing of photonic circuits Reed, Graham T. Milosevic, Milan M. Chen, Xia Cao, Wei Littlejohns, Callum George Wang, Hong Khokhar, Ali Z. Thomson, David J. Eldada, Louay A. Lee, El-Hang He, Sailing School of Electrical and Electronic Engineering SPIE OPTO Engineering::Electrical and electronic engineering Grating Couplers Ion Implantation In recent years, we have presented results on the development of erasable gratings in silicon to facilitate wafer scale testing of photonics circuits via ion implantation of germanium. Similar technology can be employed to develop a range of optical devices that are reported in this paper. Ion implantation into silicon causes radiation damage resulting in a refractive index increase, and can therefore form the basis of multiple optical devices. We demonstrate the principle of a series of devices for wafers scale testing and have also implemented the ion implantation based refractive index change in integrated photonics devices for device trimming. NRF (Natl Research Foundation, S’pore) Published version 2019-08-15T05:49:49Z 2019-12-06T22:18:50Z 2019-08-15T05:49:49Z 2019-12-06T22:18:50Z 2017 Journal Article Reed, G. T., Milosevic, M. M., Chen, X., Cao, W., Littlejohns, C. G., Wang, H., . . . Thomson, D. J. (2017). Ion implantation in silicon to facilitate testing of photonic circuits. Proceedings of SPIE - Smart Photonic and Optoelectronic Integrated Circuits XIX, 10107, 1010709-. doi:10.1117/12.2252770 0277-786X https://hdl.handle.net/10356/106808 http://hdl.handle.net/10220/49652 http://dx.doi.org/10.1117/12.2252770 en Proceedings of SPIE - Smart Photonic and Optoelectronic Integrated Circuits XIX © 2017 SPIE. All rights reserved. This paper was published in Proceedings of SPIE - Smart Photonic and Optoelectronic Integrated Circuits XIX and is made available with permission of SPIE. 7 p. application/pdf
institution Nanyang Technological University
building NTU Library
country Singapore
collection DR-NTU
language English
topic Engineering::Electrical and electronic engineering
Grating Couplers
Ion Implantation
spellingShingle Engineering::Electrical and electronic engineering
Grating Couplers
Ion Implantation
Reed, Graham T.
Milosevic, Milan M.
Chen, Xia
Cao, Wei
Littlejohns, Callum George
Wang, Hong
Khokhar, Ali Z.
Thomson, David J.
Ion implantation in silicon to facilitate testing of photonic circuits
description In recent years, we have presented results on the development of erasable gratings in silicon to facilitate wafer scale testing of photonics circuits via ion implantation of germanium. Similar technology can be employed to develop a range of optical devices that are reported in this paper. Ion implantation into silicon causes radiation damage resulting in a refractive index increase, and can therefore form the basis of multiple optical devices. We demonstrate the principle of a series of devices for wafers scale testing and have also implemented the ion implantation based refractive index change in integrated photonics devices for device trimming.
author2 Eldada, Louay A.
author_facet Eldada, Louay A.
Reed, Graham T.
Milosevic, Milan M.
Chen, Xia
Cao, Wei
Littlejohns, Callum George
Wang, Hong
Khokhar, Ali Z.
Thomson, David J.
format Article
author Reed, Graham T.
Milosevic, Milan M.
Chen, Xia
Cao, Wei
Littlejohns, Callum George
Wang, Hong
Khokhar, Ali Z.
Thomson, David J.
author_sort Reed, Graham T.
title Ion implantation in silicon to facilitate testing of photonic circuits
title_short Ion implantation in silicon to facilitate testing of photonic circuits
title_full Ion implantation in silicon to facilitate testing of photonic circuits
title_fullStr Ion implantation in silicon to facilitate testing of photonic circuits
title_full_unstemmed Ion implantation in silicon to facilitate testing of photonic circuits
title_sort ion implantation in silicon to facilitate testing of photonic circuits
publishDate 2019
url https://hdl.handle.net/10356/106808
http://hdl.handle.net/10220/49652
http://dx.doi.org/10.1117/12.2252770
_version_ 1681037783588667392