Ion implantation in silicon to facilitate testing of photonic circuits
In recent years, we have presented results on the development of erasable gratings in silicon to facilitate wafer scale testing of photonics circuits via ion implantation of germanium. Similar technology can be employed to develop a range of optical devices that are reported in this paper. Ion impla...
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Main Authors: | , , , , , , , |
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Other Authors: | |
Format: | Article |
Language: | English |
Published: |
2019
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/106808 http://hdl.handle.net/10220/49652 http://dx.doi.org/10.1117/12.2252770 |
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Institution: | Nanyang Technological University |
Language: | English |