Study of novel aspects of Ni-based silicides for ULSI devices

Study of novel aspects of Ni-based silicides for ULSI devices

Master's

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Bibliographic Details
Main Author: MD. ANISUR RAHMAN
Other Authors: PHYSICS
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
Nickel silicides (NiaSib), Nickel germanides [Niu(Si1-xGex)v], prolonged annealing, reaction kinetics, morphological stability, oxygen contamination
Online Access:http://scholarbank.nus.edu.sg/handle/10635/15396
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Institution: National University of Singapore
Language: English

Internet

http://scholarbank.nus.edu.sg/handle/10635/15396

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