Study of novel aspects of Ni-based silicides for ULSI devices
Master's
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Language: | English |
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2010
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/15396 |
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sg-nus-scholar.10635-153962015-01-06T18:26:15Z Study of novel aspects of Ni-based silicides for ULSI devices MD. ANISUR RAHMAN PHYSICS OSIPOWICZ, THOMAS Nickel silicides (NiaSib), Nickel germanides [Niu(Si1-xGex)v], prolonged annealing, reaction kinetics, morphological stability, oxygen contamination Master's MASTER OF SCIENCE 2010-04-08T10:53:04Z 2010-04-08T10:53:04Z 2006-07-24 Thesis MD. ANISUR RAHMAN (2006-07-24). Study of novel aspects of Ni-based silicides for ULSI devices. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/15396 NOT_IN_WOS en |
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National University of Singapore |
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Singapore |
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ScholarBank@NUS |
language |
English |
topic |
Nickel silicides (NiaSib), Nickel germanides [Niu(Si1-xGex)v], prolonged annealing, reaction kinetics, morphological stability, oxygen contamination |
spellingShingle |
Nickel silicides (NiaSib), Nickel germanides [Niu(Si1-xGex)v], prolonged annealing, reaction kinetics, morphological stability, oxygen contamination MD. ANISUR RAHMAN Study of novel aspects of Ni-based silicides for ULSI devices |
description |
Master's |
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PHYSICS |
author_facet |
PHYSICS MD. ANISUR RAHMAN |
format |
Theses and Dissertations |
author |
MD. ANISUR RAHMAN |
author_sort |
MD. ANISUR RAHMAN |
title |
Study of novel aspects of Ni-based silicides for ULSI devices |
title_short |
Study of novel aspects of Ni-based silicides for ULSI devices |
title_full |
Study of novel aspects of Ni-based silicides for ULSI devices |
title_fullStr |
Study of novel aspects of Ni-based silicides for ULSI devices |
title_full_unstemmed |
Study of novel aspects of Ni-based silicides for ULSI devices |
title_sort |
study of novel aspects of ni-based silicides for ulsi devices |
publishDate |
2010 |
url |
http://scholarbank.nus.edu.sg/handle/10635/15396 |
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1681079187682623488 |