A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS

Master's

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Bibliographic Details
Main Author: CHONG PEI FEN
Other Authors: DEPT OF ELECTRICAL & COMPUTER ENGG
Format: Theses and Dissertations
Published: 2019
Online Access:https://scholarbank.nus.edu.sg/handle/10635/158745
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-1587452019-09-16T13:10:42Z A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS CHONG PEI FEN DEPT OF ELECTRICAL & COMPUTER ENGG CHO BYUNG JIN CHOR ENG FONG Master's MASTER OF ENGINEERING 2019-09-16T02:37:04Z 2019-09-16T02:37:04Z 2001 Thesis CHONG PEI FEN (2001). A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/158745 CCK BATCHLOAD 20190911
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description Master's
author2 DEPT OF ELECTRICAL & COMPUTER ENGG
author_facet DEPT OF ELECTRICAL & COMPUTER ENGG
CHONG PEI FEN
format Theses and Dissertations
author CHONG PEI FEN
spellingShingle CHONG PEI FEN
A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS
author_sort CHONG PEI FEN
title A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS
title_short A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS
title_full A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS
title_fullStr A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS
title_full_unstemmed A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS
title_sort comparative study of reliability in thin gate oxides subjected to electron-beam irradiation and to electrical stress
publishDate 2019
url https://scholarbank.nus.edu.sg/handle/10635/158745
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