Effects of electron-beam lithography on thin gate oxide reliability

Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA

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Bibliographic Details
Main Authors: Chong, P.F., Cho, B.J., Chor, E.F., Joo, M.S.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70097
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Institution: National University of Singapore