Effects of electron-beam lithography on thin gate oxide reliability
Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA
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sg-nus-scholar.10635-700972015-03-23T20:19:03Z Effects of electron-beam lithography on thin gate oxide reliability Chong, P.F. Cho, B.J. Chor, E.F. Joo, M.S. ELECTRICAL & COMPUTER ENGINEERING Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 55-58 2014-06-19T03:08:12Z 2014-06-19T03:08:12Z 2001 Conference Paper Chong, P.F.,Cho, B.J.,Chor, E.F.,Joo, M.S. (2001). Effects of electron-beam lithography on thin gate oxide reliability. Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA : 55-58. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/70097 NOT_IN_WOS Scopus |
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Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Chong, P.F. Cho, B.J. Chor, E.F. Joo, M.S. |
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Conference or Workshop Item |
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Chong, P.F. Cho, B.J. Chor, E.F. Joo, M.S. |
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Chong, P.F. Cho, B.J. Chor, E.F. Joo, M.S. Effects of electron-beam lithography on thin gate oxide reliability |
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Chong, P.F. |
title |
Effects of electron-beam lithography on thin gate oxide reliability |
title_short |
Effects of electron-beam lithography on thin gate oxide reliability |
title_full |
Effects of electron-beam lithography on thin gate oxide reliability |
title_fullStr |
Effects of electron-beam lithography on thin gate oxide reliability |
title_full_unstemmed |
Effects of electron-beam lithography on thin gate oxide reliability |
title_sort |
effects of electron-beam lithography on thin gate oxide reliability |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/70097 |
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