A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS

Master's

Saved in:
Bibliographic Details
Main Author: CHONG PEI FEN
Other Authors: DEPT OF ELECTRICAL & COMPUTER ENGG
Format: Theses and Dissertations
Published: 2019
Online Access:https://scholarbank.nus.edu.sg/handle/10635/160059
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-160059
record_format dspace
spelling sg-nus-scholar.10635-1600592019-10-18T05:45:48Z A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS CHONG PEI FEN DEPT OF ELECTRICAL & COMPUTER ENGG CHO BYUNG JIN CHOR ENG FONG Master's MASTER OF ENGINEERING 2019-10-18T05:45:47Z 2019-10-18T05:45:47Z 2001 Thesis CHONG PEI FEN (2001). A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/160059 CCK BATCHLOAD 20190911
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description Master's
author2 DEPT OF ELECTRICAL & COMPUTER ENGG
author_facet DEPT OF ELECTRICAL & COMPUTER ENGG
CHONG PEI FEN
format Theses and Dissertations
author CHONG PEI FEN
spellingShingle CHONG PEI FEN
A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS
author_sort CHONG PEI FEN
title A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS
title_short A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS
title_full A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS
title_fullStr A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS
title_full_unstemmed A COMPARATIVE STUDY OF RELIABILITY IN THIN GATE OXIDES SUBJECTED TO ELECTRON-BEAM IRRADIATION AND TO ELECTRICAL STRESS
title_sort comparative study of reliability in thin gate oxides subjected to electron-beam irradiation and to electrical stress
publishDate 2019
url https://scholarbank.nus.edu.sg/handle/10635/160059
_version_ 1681100005557927936