Formation of Ultra-Shallow Junctions in Silicon- Germanium by Pulsed Laser Annealing

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Bibliographic Details
Main Author:	ABIDHA BEGUM
Other Authors:	NANOENGINEERING PROGRAMME
Format:	Theses and Dissertations
Language:	English
Published:	2010
Subjects:	Laser, Silicon, Germanium, Annealing, Shallow, Junction
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/16084
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Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-16084
record_format	dspace
spelling	sg-nus-scholar.10635-160842015-01-10T18:15:27Z Formation of Ultra-Shallow Junctions in Silicon- Germanium by Pulsed Laser Annealing ABIDHA BEGUM NANOENGINEERING PROGRAMME TAN LENG SEOW Laser, Silicon, Germanium, Annealing, Shallow, Junction Master's MASTER OF ENGINEERING 2010-04-08T11:00:52Z 2010-04-08T11:00:52Z 2008-09-16 Thesis ABIDHA BEGUM (2008-09-16). Formation of Ultra-Shallow Junctions in Silicon- Germanium by Pulsed Laser Annealing. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/16084 NOT_IN_WOS en
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
language	English
topic	Laser, Silicon, Germanium, Annealing, Shallow, Junction
spellingShingle	Laser, Silicon, Germanium, Annealing, Shallow, Junction ABIDHA BEGUM Formation of Ultra-Shallow Junctions in Silicon- Germanium by Pulsed Laser Annealing
description	Master's
author2	NANOENGINEERING PROGRAMME
author_facet	NANOENGINEERING PROGRAMME ABIDHA BEGUM
format	Theses and Dissertations
author	ABIDHA BEGUM
author_sort	ABIDHA BEGUM
title	Formation of Ultra-Shallow Junctions in Silicon- Germanium by Pulsed Laser Annealing
title_short	Formation of Ultra-Shallow Junctions in Silicon- Germanium by Pulsed Laser Annealing
title_full	Formation of Ultra-Shallow Junctions in Silicon- Germanium by Pulsed Laser Annealing
title_fullStr	Formation of Ultra-Shallow Junctions in Silicon- Germanium by Pulsed Laser Annealing
title_full_unstemmed	Formation of Ultra-Shallow Junctions in Silicon- Germanium by Pulsed Laser Annealing
title_sort	formation of ultra-shallow junctions in silicon- germanium by pulsed laser annealing
publishDate	2010
url	http://scholarbank.nus.edu.sg/handle/10635/16084
_version_	1681079303372013568

Formation of Ultra-Shallow Junctions in Silicon- Germanium by Pulsed Laser Annealing

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