Thermal processing in lithography: Equipment design, control and metrology

Ph.D

Saved in:

Bibliographic Details
Main Author:	WANG YUHENG
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Theses and Dissertations
Language:	English
Published:	2010
Subjects:	Lithogaphy, thermal processing, temperature control, real-time control, scatterometry, beam size
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/16350
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-16350
record_format	dspace
spelling	sg-nus-scholar.10635-163502015-01-31T14:40:15Z Thermal processing in lithography: Equipment design, control and metrology WANG YUHENG ELECTRICAL & COMPUTER ENGINEERING TAY EE BENG, ARTHUR ABDULLAH AL MAMUN Lithogaphy, thermal processing, temperature control, real-time control, scatterometry, beam size Ph.D DOCTOR OF PHILOSOPHY 2010-04-08T11:03:50Z 2010-04-08T11:03:50Z 2009-07-06 Thesis WANG YUHENG (2009-07-06). Thermal processing in lithography: Equipment design, control and metrology. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/16350 NOT_IN_WOS en
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
language	English
topic	Lithogaphy, thermal processing, temperature control, real-time control, scatterometry, beam size
spellingShingle	Lithogaphy, thermal processing, temperature control, real-time control, scatterometry, beam size WANG YUHENG Thermal processing in lithography: Equipment design, control and metrology
description	Ph.D
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING WANG YUHENG
format	Theses and Dissertations
author	WANG YUHENG
author_sort	WANG YUHENG
title	Thermal processing in lithography: Equipment design, control and metrology
title_short	Thermal processing in lithography: Equipment design, control and metrology
title_full	Thermal processing in lithography: Equipment design, control and metrology
title_fullStr	Thermal processing in lithography: Equipment design, control and metrology
title_full_unstemmed	Thermal processing in lithography: Equipment design, control and metrology
title_sort	thermal processing in lithography: equipment design, control and metrology
publishDate	2010
url	http://scholarbank.nus.edu.sg/handle/10635/16350
_version_	1681079348363264000

Thermal processing in lithography: Equipment design, control and metrology

Similar Items