Equipment design and control of advanced thermal-processing module in lithography

Equipment design and control of advanced thermal-processing module in lithography

10.1109/TIE.2009.2026230

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Bibliographic Details
Main Authors: Tay, A., Chua, H.T., Wang, Y., Ngo, Y.S.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Lithography
Temperature control
Thermal cycling
Thermoelectric
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55904
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/55904

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