A heater plate assisted bake/chill system for photoresist processing in photolithography

A heater plate assisted bake/chill system for photoresist processing in photolithography

10.1016/j.applthermaleng.2008.05.024

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Bibliographic Details
Main Authors: Chua, H.T., Tay, A., Wang, Y., Wu, X.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Lithography
Mica heater
Temperature control
Thermoelectric
Online Access:http://scholarbank.nus.edu.sg/handle/10635/54235
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/54235

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