A lamp thermoelectricity based integrated bake/chill system for photoresist processing

A lamp thermoelectricity based integrated bake/chill system for photoresist processing

10.1016/j.ijheatmasstransfer.2006.07.016

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Bibliographic Details
Main Authors: Tay, A., Chua, H.T., Wu, X.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Lamp heating
Microlithography
Photoresist processing
Temperature control
Thermoelectricity
Online Access:http://scholarbank.nus.edu.sg/handle/10635/54294
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/54294

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