In-situ measurement & control of photoresist development in microlithography

In-situ measurement & control of photoresist development in microlithography

10.1109/IMTC.2004.1351183

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Bibliographic Details
Main Authors: Kiew, C.M., Tay, A., Ho, W.K., Lim, K.W., Zhou, Y.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Microlithography
Photoresist development
Semiconductor manufacturing
Temperature control
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70608
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/70608

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