Control of Photoresist Thickness Uniformity in the Microlithography Process

Control of Photoresist Thickness Uniformity in the Microlithography Process

10.1109/IECON.2003.1280565

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Bibliographic Details
Main Author: Tay, A.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Photoresist Processing
Photoresist Thickness Uniformity
Semiconductor Manufacturing
Temperature Control
Online Access:http://scholarbank.nus.edu.sg/handle/10635/69731
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/69731

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