Control of Photoresist Thickness Uniformity in the Microlithography Process

10.1109/IECON.2003.1280565

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Bibliographic Details
Main Author:	Tay, A.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Photoresist Processing Photoresist Thickness Uniformity Semiconductor Manufacturing Temperature Control
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/69731
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-69731
record_format	dspace
spelling	sg-nus-scholar.10635-697312024-11-14T02:32:27Z Control of Photoresist Thickness Uniformity in the Microlithography Process Tay, A. ELECTRICAL & COMPUTER ENGINEERING Photoresist Processing Photoresist Thickness Uniformity Semiconductor Manufacturing Temperature Control 10.1109/IECON.2003.1280565 IECON Proceedings (Industrial Electronics Conference) 3 2091-2096 IEPRE 2014-06-19T03:04:01Z 2014-06-19T03:04:01Z 2003 Conference Paper Tay, A. (2003). Control of Photoresist Thickness Uniformity in the Microlithography Process. IECON Proceedings (Industrial Electronics Conference) 3 : 2091-2096. ScholarBank@NUS Repository. https://doi.org/10.1109/IECON.2003.1280565 http://scholarbank.nus.edu.sg/handle/10635/69731 000189465300358 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Photoresist Processing Photoresist Thickness Uniformity Semiconductor Manufacturing Temperature Control
spellingShingle	Photoresist Processing Photoresist Thickness Uniformity Semiconductor Manufacturing Temperature Control Tay, A. Control of Photoresist Thickness Uniformity in the Microlithography Process
description	10.1109/IECON.2003.1280565
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Tay, A.
format	Conference or Workshop Item
author	Tay, A.
author_sort	Tay, A.
title	Control of Photoresist Thickness Uniformity in the Microlithography Process
title_short	Control of Photoresist Thickness Uniformity in the Microlithography Process
title_full	Control of Photoresist Thickness Uniformity in the Microlithography Process
title_fullStr	Control of Photoresist Thickness Uniformity in the Microlithography Process
title_full_unstemmed	Control of Photoresist Thickness Uniformity in the Microlithography Process
title_sort	control of photoresist thickness uniformity in the microlithography process
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/69731
_version_	1821222509138149376

Control of Photoresist Thickness Uniformity in the Microlithography Process

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