Control of Photoresist Thickness Uniformity in the Microlithography Process

Control of Photoresist Thickness Uniformity in the Microlithography Process

10.1109/IECON.2003.1280565

Saved in:
Bibliographic Details
Main Author: Tay, A.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Photoresist Processing
Photoresist Thickness Uniformity
Semiconductor Manufacturing
Temperature Control
Online Access:http://scholarbank.nus.edu.sg/handle/10635/69731
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Description
Summary:10.1109/IECON.2003.1280565

Similar Items