In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithography

In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithography

10.1109/TIM.2009.2021620

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Bibliographic Details
Main Authors: Tay, A., Ho, W.K., Wu, X., Chen, X.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Lithography
Photoresist processing
Photoresist thickness monitoring
Semiconductor manufacturing
Spectrometers
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56298
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/56298

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