In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithography

In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithography

10.1109/TIM.2009.2021620

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Bibliographic Details
Main Authors: Tay, A., Ho, W.K., Wu, X., Chen, X.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Lithography
Photoresist processing
Photoresist thickness monitoring
Semiconductor manufacturing
Spectrometers
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56298
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-562982023-10-25T23:12:53Z In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithography Tay, A. Ho, W.K. Wu, X. Chen, X. ELECTRICAL & COMPUTER ENGINEERING Lithography Photoresist processing Photoresist thickness monitoring Semiconductor manufacturing Spectrometers 10.1109/TIM.2009.2021620 IEEE Transactions on Instrumentation and Measurement 58 12 3978-3984 IEIMA 2014-06-17T02:53:00Z 2014-06-17T02:53:00Z 2009-12 Article Tay, A., Ho, W.K., Wu, X., Chen, X. (2009-12). In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithography. IEEE Transactions on Instrumentation and Measurement 58 (12) : 3978-3984. ScholarBank@NUS Repository. https://doi.org/10.1109/TIM.2009.2021620 00189456 http://scholarbank.nus.edu.sg/handle/10635/56298 000271678000007 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Lithography
Photoresist processing
Photoresist thickness monitoring
Semiconductor manufacturing
Spectrometers
spellingShingle Lithography
Photoresist processing
Photoresist thickness monitoring
Semiconductor manufacturing
Spectrometers
Tay, A.
Ho, W.K.
Wu, X.
Chen, X.
In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithography
description 10.1109/TIM.2009.2021620
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Tay, A.
Ho, W.K.
Wu, X.
Chen, X.
format Article
author Tay, A.
Ho, W.K.
Wu, X.
Chen, X.
author_sort Tay, A.
title In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithography
title_short In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithography
title_full In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithography
title_fullStr In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithography
title_full_unstemmed In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithography
title_sort in situ monitoring of photoresist thickness uniformity of a rotating wafer in lithography
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/56298
_version_ 1781781148210298880

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