Real-time control of photoresist extinction coefficient uniformity in the microlithography process

Real-time control of photoresist extinction coefficient uniformity in the microlithography process

10.1109/TCST.2006.883244

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Bibliographic Details
Main Authors: Tay, A., Ho, W.K., Wu, X.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Lithography
Photoresist extinction coefficient
Photoresist processing
Real-time control
Temperature control
Online Access:http://scholarbank.nus.edu.sg/handle/10635/57203
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/57203

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