Real-time control of photoresist development process

Real-time control of photoresist development process

10.1117/12.599630

Saved in:
Bibliographic Details
Main Authors: Tay, A., Ho, W.-K., Kiew, C.-M., Zhou, Y., Lee, J.H.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Photoresist development
Photoresist processing
Temperature control
Online Access:http://scholarbank.nus.edu.sg/handle/10635/71562
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/71562

Similar Items