Real-time control of photoresist development process

10.1117/12.599630

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Bibliographic Details
Main Authors:	Tay, A., Ho, W.-K., Kiew, C.-M., Zhou, Y., Lee, J.H.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Photoresist development Photoresist processing Temperature control
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/71562
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Institution:	National University of Singapore

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