Real-time control of photoresist extinction coefficient uniformity in the microlithography process

10.1109/TCST.2006.883244

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Bibliographic Details
Main Authors:	Tay, A., Ho, W.K., Wu, X.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Lithography Photoresist extinction coefficient Photoresist processing Real-time control Temperature control
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/57203
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-57203
record_format	dspace
spelling	sg-nus-scholar.10635-572032023-10-27T09:17:32Z Real-time control of photoresist extinction coefficient uniformity in the microlithography process Tay, A. Ho, W.K. Wu, X. ELECTRICAL & COMPUTER ENGINEERING Lithography Photoresist extinction coefficient Photoresist processing Real-time control Temperature control 10.1109/TCST.2006.883244 IEEE Transactions on Control Systems Technology 15 1 99-105 IETTE 2014-06-17T03:03:29Z 2014-06-17T03:03:29Z 2007-01 Article Tay, A., Ho, W.K., Wu, X. (2007-01). Real-time control of photoresist extinction coefficient uniformity in the microlithography process. IEEE Transactions on Control Systems Technology 15 (1) : 99-105. ScholarBank@NUS Repository. https://doi.org/10.1109/TCST.2006.883244 10636536 http://scholarbank.nus.edu.sg/handle/10635/57203 000243342200010 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Lithography Photoresist extinction coefficient Photoresist processing Real-time control Temperature control
spellingShingle	Lithography Photoresist extinction coefficient Photoresist processing Real-time control Temperature control Tay, A. Ho, W.K. Wu, X. Real-time control of photoresist extinction coefficient uniformity in the microlithography process
description	10.1109/TCST.2006.883244
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Tay, A. Ho, W.K. Wu, X.
format	Article
author	Tay, A. Ho, W.K. Wu, X.
author_sort	Tay, A.
title	Real-time control of photoresist extinction coefficient uniformity in the microlithography process
title_short	Real-time control of photoresist extinction coefficient uniformity in the microlithography process
title_full	Real-time control of photoresist extinction coefficient uniformity in the microlithography process
title_fullStr	Real-time control of photoresist extinction coefficient uniformity in the microlithography process
title_full_unstemmed	Real-time control of photoresist extinction coefficient uniformity in the microlithography process
title_sort	real-time control of photoresist extinction coefficient uniformity in the microlithography process
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/57203
_version_	1781781365843296256

Real-time control of photoresist extinction coefficient uniformity in the microlithography process

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