In-situ measurement & control of photoresist development in microlithography

10.1109/IMTC.2004.1351183

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Bibliographic Details
Main Authors:	Kiew, C.M., Tay, A., Ho, W.K., Lim, K.W., Zhou, Y.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Microlithography Photoresist development Semiconductor manufacturing Temperature control
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/70608
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Institution:	National University of Singapore

Description
Summary:	10.1109/IMTC.2004.1351183

In-situ measurement &amp; control of photoresist development in microlithography