In-situ measurement and control for photoresist processing in microlithography

by Tay, A., Ho, W.-K., Wu, X., Kiew, C.-M.
Published 2014

Optimal feed-forward control for multizone baking in microlithography

by Ho, W.K., Tay, A., Chen, M., Kiew, C.M.
Published 2014

In-situ measurement & control of photoresist development in microlithography

by Kiew, C.M., Tay, A., Ho, W.K., Lim, K.W., Zhou, Y.
Published 2014

In-situ measurement & control of photoresist development in microlithography

by Kiew, C.M., Tay, A., Ho, W.K., Lim, K.W., Zhou, Y.
Published 2014

Real-time control of photoresist development process

by Tay, A., Ho, W.-K., Kiew, C.-M., Zhou, Y., Lee, J.H.
Published 2014

Real-time spatial control of photoresist development rate

by Tay, A., Ho, W.-K., Hu, N., Kiew, C.-M., Tsai, K.-Y.
Published 2014

Robust real-time thin film thickness estimation

by Kiew, C.M., Tay, A., Ho, W.K., Lim, K.W., Lee, J.H.
Published 2014