An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography

An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography

10.1109/TSM.2007.890770

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Bibliographic Details
Main Authors: Tay, A., Ho, W.K., Hu, N.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Microlithography
Photoresist processing
Real-time control
Semiconductor manufacturing
Temperature control
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55029
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/55029

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