An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography

An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography

10.1109/TSM.2007.890770

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Bibliographic Details
Main Authors: Tay, A., Ho, W.K., Hu, N.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Microlithography
Photoresist processing
Real-time control
Semiconductor manufacturing
Temperature control
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55029
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-550292023-10-27T09:24:37Z An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography Tay, A. Ho, W.K. Hu, N. ELECTRICAL & COMPUTER ENGINEERING Microlithography Photoresist processing Real-time control Semiconductor manufacturing Temperature control 10.1109/TSM.2007.890770 IEEE Transactions on Semiconductor Manufacturing 20 1 5-12 ITSME 2014-06-17T02:38:20Z 2014-06-17T02:38:20Z 2007-02 Article Tay, A., Ho, W.K., Hu, N. (2007-02). An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography. IEEE Transactions on Semiconductor Manufacturing 20 (1) : 5-12. ScholarBank@NUS Repository. https://doi.org/10.1109/TSM.2007.890770 08946507 http://scholarbank.nus.edu.sg/handle/10635/55029 000244191300002 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Microlithography
Photoresist processing
Real-time control
Semiconductor manufacturing
Temperature control
spellingShingle Microlithography
Photoresist processing
Real-time control
Semiconductor manufacturing
Temperature control
Tay, A.
Ho, W.K.
Hu, N.
An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
description 10.1109/TSM.2007.890770
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Tay, A.
Ho, W.K.
Hu, N.
format Article
author Tay, A.
Ho, W.K.
Hu, N.
author_sort Tay, A.
title An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
title_short An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
title_full An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
title_fullStr An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
title_full_unstemmed An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
title_sort in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/55029
_version_ 1781412062286577664

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