A lamp thermoelectricity based integrated bake/chill system for photoresist processing
10.1016/j.ijheatmasstransfer.2006.07.016
Saved in:
Main Authors: | Tay, A., Chua, H.T., Wu, X. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
|
Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/54294 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
In-situ measurement and control for photoresist processing in microlithography
by: Tay, A., et al.
Published: (2014) -
In-situ measurement & control of photoresist development in microlithography
by: Kiew, C.M., et al.
Published: (2014) -
A heater plate assisted integrated bake/chill system for photoresist processing
by: Chua, H.-T., et al.
Published: (2014) -
A heater plate assisted bake/chill system for photoresist processing in photolithography
by: Chua, H.T., et al.
Published: (2014) -
Integrated bake/chill module with in situ temperature measurement for photoresist processing
by: Tay, A., et al.
Published: (2014)