Control of photoresist film thickness: Iterative feedback tuning approach

Control of photoresist film thickness: Iterative feedback tuning approach

10.1016/j.compchemeng.2005.10.004

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Bibliographic Details
Main Authors: Tay, A., Khuen Ho, W., Deng, J., Keng Lok, B.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Iterative feedback tuning
Microlithography
Photoresist processing
Self-tuning control
Semiconductor manufacturing
Temperature control
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55413
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/55413

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