Equipment design and control of advanced thermal-processing module in lithography

10.1109/TIE.2009.2026230

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Bibliographic Details
Main Authors:	Tay, A., Chua, H.T., Wang, Y., Ngo, Y.S.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Lithography Temperature control Thermal cycling Thermoelectric
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/55904
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Institution:	National University of Singapore

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