Trimming-Less 0.2-V, 3.2-pW Voltage Reference Based on Corner-Aware Replica Combination with 1.6% Process Sensitivity, 1.4-mV Accuracy across PVT and Wafers
IEEE ESSCIRC 2021
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Main Authors: | , , , , , |
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Other Authors: | |
Format: | Conference or Workshop Item |
Published: |
IEEE
2021
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Online Access: | https://scholarbank.nus.edu.sg/handle/10635/192143 |
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Institution: | National University of Singapore |
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