Local phenomena at grain boundaries: An alternative approach to grasp the role of oxygen vacancies in metallization of VO2

Local phenomena at grain boundaries: An alternative approach to grasp the role of oxygen vacancies in metallization of VO2

10.1016/j.jmat.2018.09.003

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Bibliographic Details
Main Authors: Lu, W., Wong, L.-M., Wang, S., Zeng, K.
Other Authors: ELECTRICAL AND COMPUTER ENGINEERING
Format: Article
Published: Chinese Ceramic Society 2022
Subjects:
c-AFM
ESM
Fermi level
KPFM
VO2 thin film
Online Access:https://scholarbank.nus.edu.sg/handle/10635/214009
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Institution: National University of Singapore

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https://scholarbank.nus.edu.sg/handle/10635/214009

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