Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si1-xGex/Si nMOSFETs with HfO2gate dielectric

10.1088/0268-1242/21/5/017

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Main Authors:	Yeo, C.C., Cho, B.J., Lee, M.H., Liu, C.W., Choi, K.J., Lee, T.W.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2011
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/25762
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-25762
record_format	dspace
spelling	sg-nus-scholar.10635-257622023-10-29T20:28:56Z Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si1-xGex/Si nMOSFETs with HfO2gate dielectric Yeo, C.C. Cho, B.J. Lee, M.H. Liu, C.W. Choi, K.J. Lee, T.W. ELECTRICAL & COMPUTER ENGINEERING PAEDIATRICS 10.1088/0268-1242/21/5/017 Semiconductor Science and Technology 21 5 665-669 2011-08-16T07:52:51Z 2011-08-16T07:52:51Z 2006 Article Yeo, C.C., Cho, B.J., Lee, M.H., Liu, C.W., Choi, K.J., Lee, T.W. (2006). Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si1-xGex/Si nMOSFETs with HfO2gate dielectric. Semiconductor Science and Technology 21 (5) : 665-669. ScholarBank@NUS Repository. https://doi.org/10.1088/0268-1242/21/5/017 02681242 13616641 http://scholarbank.nus.edu.sg/handle/10635/25762 000237885000019 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1088/0268-1242/21/5/017
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Yeo, C.C. Cho, B.J. Lee, M.H. Liu, C.W. Choi, K.J. Lee, T.W.
format	Article
author	Yeo, C.C. Cho, B.J. Lee, M.H. Liu, C.W. Choi, K.J. Lee, T.W.
spellingShingle	Yeo, C.C. Cho, B.J. Lee, M.H. Liu, C.W. Choi, K.J. Lee, T.W. Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si1-xGex/Si nMOSFETs with HfO2gate dielectric
author_sort	Yeo, C.C.
title	Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si1-xGex/Si nMOSFETs with HfO2gate dielectric
title_short	Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si1-xGex/Si nMOSFETs with HfO2gate dielectric
title_full	Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si1-xGex/Si nMOSFETs with HfO2gate dielectric
title_fullStr	Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si1-xGex/Si nMOSFETs with HfO2gate dielectric
title_full_unstemmed	Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si1-xGex/Si nMOSFETs with HfO2gate dielectric
title_sort	thermal stability study of si cap/ultrathin ge/si and strained si/si1-xgex/si nmosfets with hfo2gate dielectric
publishDate	2011
url	http://scholarbank.nus.edu.sg/handle/10635/25762
_version_	1781410443590369280

Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si1-xGex/Si nMOSFETs with HfO2gate dielectric

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