Study on etching and characterization of advanced gate stack

Master's

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Bibliographic Details
Main Author: TAN KIAN MING
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Theses and Dissertations
Language:English
Published: 2011
Subjects:
Online Access:https://scholarbank.nus.edu.sg/handle/10635/27680
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Institution: National University of Singapore
Language: English
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spelling sg-nus-scholar.10635-276802024-10-26T04:38:25Z Study on etching and characterization of advanced gate stack TAN KIAN MING ELECTRICAL & COMPUTER ENGINEERING YOO WON JONG Etching, Poly SiGe, HfO2, Trimming, Notch Gate Master's MASTER OF ENGINEERING 2011-10-12T18:01:09Z 2011-10-12T18:01:09Z 2004-11-30 Thesis TAN KIAN MING (2004-11-30). Study on etching and characterization of advanced gate stack. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/27680 NOT_IN_WOS en
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
language English
topic Etching, Poly SiGe, HfO2, Trimming, Notch Gate
spellingShingle Etching, Poly SiGe, HfO2, Trimming, Notch Gate
TAN KIAN MING
Study on etching and characterization of advanced gate stack
description Master's
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
TAN KIAN MING
format Theses and Dissertations
author TAN KIAN MING
author_sort TAN KIAN MING
title Study on etching and characterization of advanced gate stack
title_short Study on etching and characterization of advanced gate stack
title_full Study on etching and characterization of advanced gate stack
title_fullStr Study on etching and characterization of advanced gate stack
title_full_unstemmed Study on etching and characterization of advanced gate stack
title_sort study on etching and characterization of advanced gate stack
publishDate 2011
url https://scholarbank.nus.edu.sg/handle/10635/27680
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