Control of Resist Processing in Lithography
Ph.D
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2011
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sg-nus-scholar.10635-281852015-01-21T21:07:58Z Control of Resist Processing in Lithography KIEW CHOON MENG NUS GRAD SCH FOR INTEGRATIVE SCI & ENGG Thickness Estimation, Develop Step, Process Control, Feedforward Control, Minimax Ph.D DOCTOR OF PHILOSOPHY 2011-11-08T18:01:32Z 2011-11-08T18:01:32Z 2008-06-09 Thesis KIEW CHOON MENG (2008-06-09). Control of Resist Processing in Lithography. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/28185 NOT_IN_WOS en |
institution |
National University of Singapore |
building |
NUS Library |
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Singapore |
collection |
ScholarBank@NUS |
language |
English |
topic |
Thickness Estimation, Develop Step, Process Control, Feedforward Control, Minimax |
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Thickness Estimation, Develop Step, Process Control, Feedforward Control, Minimax KIEW CHOON MENG Control of Resist Processing in Lithography |
description |
Ph.D |
author2 |
NUS GRAD SCH FOR INTEGRATIVE SCI & ENGG |
author_facet |
NUS GRAD SCH FOR INTEGRATIVE SCI & ENGG KIEW CHOON MENG |
format |
Theses and Dissertations |
author |
KIEW CHOON MENG |
author_sort |
KIEW CHOON MENG |
title |
Control of Resist Processing in Lithography |
title_short |
Control of Resist Processing in Lithography |
title_full |
Control of Resist Processing in Lithography |
title_fullStr |
Control of Resist Processing in Lithography |
title_full_unstemmed |
Control of Resist Processing in Lithography |
title_sort |
control of resist processing in lithography |
publishDate |
2011 |
url |
http://scholarbank.nus.edu.sg/handle/10635/28185 |
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1681080665014009856 |