Control of Resist Processing in Lithography

Ph.D

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Bibliographic Details
Main Author: KIEW CHOON MENG
Other Authors: NUS GRAD SCH FOR INTEGRATIVE SCI & ENGG
Format: Theses and Dissertations
Language:English
Published: 2011
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/28185
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Institution: National University of Singapore
Language: English
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spelling sg-nus-scholar.10635-281852015-01-21T21:07:58Z Control of Resist Processing in Lithography KIEW CHOON MENG NUS GRAD SCH FOR INTEGRATIVE SCI & ENGG Thickness Estimation, Develop Step, Process Control, Feedforward Control, Minimax Ph.D DOCTOR OF PHILOSOPHY 2011-11-08T18:01:32Z 2011-11-08T18:01:32Z 2008-06-09 Thesis KIEW CHOON MENG (2008-06-09). Control of Resist Processing in Lithography. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/28185 NOT_IN_WOS en
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
language English
topic Thickness Estimation, Develop Step, Process Control, Feedforward Control, Minimax
spellingShingle Thickness Estimation, Develop Step, Process Control, Feedforward Control, Minimax
KIEW CHOON MENG
Control of Resist Processing in Lithography
description Ph.D
author2 NUS GRAD SCH FOR INTEGRATIVE SCI & ENGG
author_facet NUS GRAD SCH FOR INTEGRATIVE SCI & ENGG
KIEW CHOON MENG
format Theses and Dissertations
author KIEW CHOON MENG
author_sort KIEW CHOON MENG
title Control of Resist Processing in Lithography
title_short Control of Resist Processing in Lithography
title_full Control of Resist Processing in Lithography
title_fullStr Control of Resist Processing in Lithography
title_full_unstemmed Control of Resist Processing in Lithography
title_sort control of resist processing in lithography
publishDate 2011
url http://scholarbank.nus.edu.sg/handle/10635/28185
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