Method to deposit a platinum seed layer for use in selective copper plating

US6251781

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Bibliographic Details
Main Authors: ZHOU, MEI SHENG, XU, GUO-QIN, CHAN, LAP
Other Authors: CHEMISTRY
Format: Patent
Published: 2012
Online Access:http://scholarbank.nus.edu.sg/handle/10635/32592
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Institution: National University of Singapore