Method to deposit a platinum seed layer for use in selective copper plating

US6251781

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Main Authors: ZHOU, MEI SHENG, XU, GUO-QIN, CHAN, LAP
Other Authors: CHEMISTRY
Format: Patent
Published: 2012
Online Access:http://scholarbank.nus.edu.sg/handle/10635/32592
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Institution: National University of Singapore
id sg-nus-scholar.10635-32592
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spelling sg-nus-scholar.10635-325922015-07-29T07:03:42Z Method to deposit a platinum seed layer for use in selective copper plating ZHOU, MEI SHENG XU, GUO-QIN CHAN, LAP CHEMISTRY CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SINGAPORE, SG) NATIONAL UNIVERSITY OF SINGAPORE US6251781 Granted Patent 2012-05-02T02:27:30Z 2012-05-02T02:27:30Z 2001-06-26 Patent ZHOU, MEI SHENG,XU, GUO-QIN,CHAN, LAP (2001-06-26). Method to deposit a platinum seed layer for use in selective copper plating. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/32592 NOT_IN_WOS PatSnap
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description US6251781
author2 CHEMISTRY
author_facet CHEMISTRY
ZHOU, MEI SHENG
XU, GUO-QIN
CHAN, LAP
format Patent
author ZHOU, MEI SHENG
XU, GUO-QIN
CHAN, LAP
spellingShingle ZHOU, MEI SHENG
XU, GUO-QIN
CHAN, LAP
Method to deposit a platinum seed layer for use in selective copper plating
author_sort ZHOU, MEI SHENG
title Method to deposit a platinum seed layer for use in selective copper plating
title_short Method to deposit a platinum seed layer for use in selective copper plating
title_full Method to deposit a platinum seed layer for use in selective copper plating
title_fullStr Method to deposit a platinum seed layer for use in selective copper plating
title_full_unstemmed Method to deposit a platinum seed layer for use in selective copper plating
title_sort method to deposit a platinum seed layer for use in selective copper plating
publishDate 2012
url http://scholarbank.nus.edu.sg/handle/10635/32592
_version_ 1681081251561209856