The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films

10.1063/1.1997293

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Main Authors: Cai, J., Gong, H.
Other Authors: BIOENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/52558
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-525582023-10-30T08:52:02Z The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films Cai, J. Gong, H. BIOENGINEERING MATERIALS SCIENCE 10.1063/1.1997293 Journal of Applied Physics 98 3 - JAPIA 2014-05-16T04:59:15Z 2014-05-16T04:59:15Z 2005-08-01 Article Cai, J., Gong, H. (2005-08-01). The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films. Journal of Applied Physics 98 (3) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1997293 00218979 http://scholarbank.nus.edu.sg/handle/10635/52558 000231246100051 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.1997293
author2 BIOENGINEERING
author_facet BIOENGINEERING
Cai, J.
Gong, H.
format Article
author Cai, J.
Gong, H.
spellingShingle Cai, J.
Gong, H.
The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films
author_sort Cai, J.
title The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films
title_short The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films
title_full The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films
title_fullStr The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films
title_full_unstemmed The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films
title_sort influence of cu/al ratio on properties of chemical-vapor-deposition-grown p -type cu-al-o transparent semiconducting films
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/52558
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