The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films
10.1063/1.1997293
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sg-nus-scholar.10635-525582023-10-30T08:52:02Z The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films Cai, J. Gong, H. BIOENGINEERING MATERIALS SCIENCE 10.1063/1.1997293 Journal of Applied Physics 98 3 - JAPIA 2014-05-16T04:59:15Z 2014-05-16T04:59:15Z 2005-08-01 Article Cai, J., Gong, H. (2005-08-01). The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films. Journal of Applied Physics 98 (3) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1997293 00218979 http://scholarbank.nus.edu.sg/handle/10635/52558 000231246100051 Scopus |
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10.1063/1.1997293 |
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BIOENGINEERING |
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BIOENGINEERING Cai, J. Gong, H. |
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Cai, J. Gong, H. |
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Cai, J. Gong, H. The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films |
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Cai, J. |
title |
The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films |
title_short |
The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films |
title_full |
The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films |
title_fullStr |
The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films |
title_full_unstemmed |
The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p -type Cu-Al-O transparent semiconducting films |
title_sort |
influence of cu/al ratio on properties of chemical-vapor-deposition-grown p -type cu-al-o transparent semiconducting films |
publishDate |
2014 |
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http://scholarbank.nus.edu.sg/handle/10635/52558 |
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