Effect of annealing and applied bias on barrier shape in CoFe/MgO/CoFe tunnel junctions

Effect of annealing and applied bias on barrier shape in CoFe/MgO/CoFe tunnel junctions

10.1103/PhysRevB.83.165413

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Bibliographic Details
Main Authors: Liu, Y., Chiaramonti, A.N., Schreiber, D.K., Yang, H., Parkin, S.S.P., Heinonen, O.G., Petford-Long, A.K.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55740
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/55740

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