Effect of annealing and applied bias on barrier shape in CoFe/MgO/CoFe tunnel junctions

• Main Authors: Liu, Y., Chiaramonti, A.N., Schreiber, D.K., Yang, H., Parkin, S.S.P., Heinonen, O.G., Petford-Long, A.K.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/55740
• Institution: National University of Singapore

10.1103/PhysRevB.83.165413