Evolution of quasi-breakdown in thin gate oxides
10.1063/1.1464648
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sg-nus-scholar.10635-559232023-10-25T20:21:51Z Evolution of quasi-breakdown in thin gate oxides Loh, W.Y. Cho, B.J. Li, M.F. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.1464648 Journal of Applied Physics 91 8 5302-5306 JAPIA 2014-06-17T02:48:39Z 2014-06-17T02:48:39Z 2002-04-15 Article Loh, W.Y., Cho, B.J., Li, M.F. (2002-04-15). Evolution of quasi-breakdown in thin gate oxides. Journal of Applied Physics 91 (8) : 5302-5306. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1464648 00218979 http://scholarbank.nus.edu.sg/handle/10635/55923 000174666600084 Scopus |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Loh, W.Y. Cho, B.J. Li, M.F. |
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Loh, W.Y. Cho, B.J. Li, M.F. |
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Loh, W.Y. Cho, B.J. Li, M.F. Evolution of quasi-breakdown in thin gate oxides |
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Loh, W.Y. |
title |
Evolution of quasi-breakdown in thin gate oxides |
title_short |
Evolution of quasi-breakdown in thin gate oxides |
title_full |
Evolution of quasi-breakdown in thin gate oxides |
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Evolution of quasi-breakdown in thin gate oxides |
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Evolution of quasi-breakdown in thin gate oxides |
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evolution of quasi-breakdown in thin gate oxides |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/55923 |
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