Thermal stability improvement of the lanthanum aluminate/silicon interface using a thin yttrium interlayer

Thermal stability improvement of the lanthanum aluminate/silicon interface using a thin yttrium interlayer

10.1149/1.3494150

Saved in:
Bibliographic Details
Main Authors: Liu, Z.Q., Chiam, S.Y., Chim, W.K., Pan, J.S., Ng, C.M.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/57652
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Description
Summary:10.1149/1.3494150

Similar Items