Characterisation of pyramid formation arising from the TMAH etching of silicon

• Main Authors: Choi, W.K., Thong, J.T.L., Luo, P., Tan, C.M., Chua, T.H., Bai, Y.
• Other Authors: MECHANICAL & PRODUCTION ENGINEERING
• Format: Article
• Published: 2014
• Subjects: Etching parameters; Pyramids; Silicon; Tetramethylammonium hydroxide (TMAH)
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/57991
• Institution: National University of Singapore

Sensors and Actuators, A: Physical