Characterization of silicon isotropic etch by inductively coupled plasma etcher for microneedle array fabrication
10.1088/1742-6596/34/1/188
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2014
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sg-nus-scholar.10635-597002023-10-26T07:09:21Z Characterization of silicon isotropic etch by inductively coupled plasma etcher for microneedle array fabrication Ji, J. Tay, F.E.H. Miao, J. Sun, J. MECHANICAL ENGINEERING 10.1088/1742-6596/34/1/188 Journal of Physics: Conference Series 34 1 1137-1142 2014-06-17T06:14:34Z 2014-06-17T06:14:34Z 2006-04-01 Article Ji, J., Tay, F.E.H., Miao, J., Sun, J. (2006-04-01). Characterization of silicon isotropic etch by inductively coupled plasma etcher for microneedle array fabrication. Journal of Physics: Conference Series 34 (1) : 1137-1142. ScholarBank@NUS Repository. https://doi.org/10.1088/1742-6596/34/1/188 17426588 http://scholarbank.nus.edu.sg/handle/10635/59700 000286667100188 Scopus |
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| description |
10.1088/1742-6596/34/1/188 |
| author2 |
MECHANICAL ENGINEERING |
| author_facet |
MECHANICAL ENGINEERING Ji, J. Tay, F.E.H. Miao, J. Sun, J. |
| format |
Article |
| author |
Ji, J. Tay, F.E.H. Miao, J. Sun, J. |
| spellingShingle |
Ji, J. Tay, F.E.H. Miao, J. Sun, J. Characterization of silicon isotropic etch by inductively coupled plasma etcher for microneedle array fabrication |
| author_sort |
Ji, J. |
| title |
Characterization of silicon isotropic etch by inductively coupled plasma etcher for microneedle array fabrication |
| title_short |
Characterization of silicon isotropic etch by inductively coupled plasma etcher for microneedle array fabrication |
| title_full |
Characterization of silicon isotropic etch by inductively coupled plasma etcher for microneedle array fabrication |
| title_fullStr |
Characterization of silicon isotropic etch by inductively coupled plasma etcher for microneedle array fabrication |
| title_full_unstemmed |
Characterization of silicon isotropic etch by inductively coupled plasma etcher for microneedle array fabrication |
| title_sort |
characterization of silicon isotropic etch by inductively coupled plasma etcher for microneedle array fabrication |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/59700 |
| _version_ |
1781781682848792576 |