Characterization of silicon isotropic etch by inductively coupled plasma etcher for microneedle array fabrication

Characterization of silicon isotropic etch by inductively coupled plasma etcher for microneedle array fabrication

10.1088/1742-6596/34/1/188

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Bibliographic Details
Main Authors: Ji, J., Tay, F.E.H., Miao, J., Sun, J.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/59700
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Institution: National University of Singapore
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