Process analysis and optimization on PECVD amorphous silicon on glass substrate

10.1088/1742-6596/34/1/134

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Bibliographic Details
Main Authors:	Ong, Y.Y., Chen, B.T., Tay, F.E.H., Iliescu, C.
Other Authors:	MECHANICAL ENGINEERING
Format:	Article
Published:	2014
Subjects:	Amorphous silicon Deposition rate Low stress PECVD
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/61152
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-61152
record_format	dspace
spelling	sg-nus-scholar.10635-611522024-11-12T19:00:28Z Process analysis and optimization on PECVD amorphous silicon on glass substrate Ong, Y.Y. Chen, B.T. Tay, F.E.H. Iliescu, C. MECHANICAL ENGINEERING Amorphous silicon Deposition rate Low stress PECVD 10.1088/1742-6596/34/1/134 Journal of Physics: Conference Series 34 1 812-817 2014-06-17T06:31:39Z 2014-06-17T06:31:39Z 2006-04-01 Article Ong, Y.Y., Chen, B.T., Tay, F.E.H., Iliescu, C. (2006-04-01). Process analysis and optimization on PECVD amorphous silicon on glass substrate. Journal of Physics: Conference Series 34 (1) : 812-817. ScholarBank@NUS Repository. https://doi.org/10.1088/1742-6596/34/1/134 17426588 http://scholarbank.nus.edu.sg/handle/10635/61152 000286667100134 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Amorphous silicon Deposition rate Low stress PECVD
spellingShingle	Amorphous silicon Deposition rate Low stress PECVD Ong, Y.Y. Chen, B.T. Tay, F.E.H. Iliescu, C. Process analysis and optimization on PECVD amorphous silicon on glass substrate
description	10.1088/1742-6596/34/1/134
author2	MECHANICAL ENGINEERING
author_facet	MECHANICAL ENGINEERING Ong, Y.Y. Chen, B.T. Tay, F.E.H. Iliescu, C.
format	Article
author	Ong, Y.Y. Chen, B.T. Tay, F.E.H. Iliescu, C.
author_sort	Ong, Y.Y.
title	Process analysis and optimization on PECVD amorphous silicon on glass substrate
title_short	Process analysis and optimization on PECVD amorphous silicon on glass substrate
title_full	Process analysis and optimization on PECVD amorphous silicon on glass substrate
title_fullStr	Process analysis and optimization on PECVD amorphous silicon on glass substrate
title_full_unstemmed	Process analysis and optimization on PECVD amorphous silicon on glass substrate
title_sort	process analysis and optimization on pecvd amorphous silicon on glass substrate
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/61152
_version_	1821215526211289088

Process analysis and optimization on PECVD amorphous silicon on glass substrate

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