Optimization of an amorphous silicon mask PECVD process for deep wet etching of Pyrex glass

Optimization of an amorphous silicon mask PECVD process for deep wet etching of Pyrex glass

10.1016/j.surfcoat.2004.03.043

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Bibliographic Details
Main Authors: Iliescu, C., Miao, J., Tay, F.E.H.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
Amorphous silicon
Glass etching
Residual stress
Online Access:http://scholarbank.nus.edu.sg/handle/10635/61019
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/61019

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