Optimization of an amorphous silicon mask PECVD process for deep wet etching of Pyrex glass

10.1016/j.surfcoat.2004.03.043

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Main Authors:	Iliescu, C., Miao, J., Tay, F.E.H.
Other Authors:	MECHANICAL ENGINEERING
Format:	Article
Published:	2014
Subjects:	Amorphous silicon Glass etching Residual stress
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/61019
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-61019
record_format	dspace
spelling	sg-nus-scholar.10635-610192023-10-30T21:07:23Z Optimization of an amorphous silicon mask PECVD process for deep wet etching of Pyrex glass Iliescu, C. Miao, J. Tay, F.E.H. MECHANICAL ENGINEERING Amorphous silicon Glass etching Residual stress 10.1016/j.surfcoat.2004.03.043 Surface and Coatings Technology 192 1 43-47 2014-06-17T06:30:02Z 2014-06-17T06:30:02Z 2005-03-01 Article Iliescu, C., Miao, J., Tay, F.E.H. (2005-03-01). Optimization of an amorphous silicon mask PECVD process for deep wet etching of Pyrex glass. Surface and Coatings Technology 192 (1) : 43-47. ScholarBank@NUS Repository. https://doi.org/10.1016/j.surfcoat.2004.03.043 02578972 http://scholarbank.nus.edu.sg/handle/10635/61019 000226262300006 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Amorphous silicon Glass etching Residual stress
spellingShingle	Amorphous silicon Glass etching Residual stress Iliescu, C. Miao, J. Tay, F.E.H. Optimization of an amorphous silicon mask PECVD process for deep wet etching of Pyrex glass
description	10.1016/j.surfcoat.2004.03.043
author2	MECHANICAL ENGINEERING
author_facet	MECHANICAL ENGINEERING Iliescu, C. Miao, J. Tay, F.E.H.
format	Article
author	Iliescu, C. Miao, J. Tay, F.E.H.
author_sort	Iliescu, C.
title	Optimization of an amorphous silicon mask PECVD process for deep wet etching of Pyrex glass
title_short	Optimization of an amorphous silicon mask PECVD process for deep wet etching of Pyrex glass
title_full	Optimization of an amorphous silicon mask PECVD process for deep wet etching of Pyrex glass
title_fullStr	Optimization of an amorphous silicon mask PECVD process for deep wet etching of Pyrex glass
title_full_unstemmed	Optimization of an amorphous silicon mask PECVD process for deep wet etching of Pyrex glass
title_sort	optimization of an amorphous silicon mask pecvd process for deep wet etching of pyrex glass
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/61019
_version_	1781781960066072576

Optimization of an amorphous silicon mask PECVD process for deep wet etching of Pyrex glass

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