Stress control in masking layers for deep wet micromachining of Pyrex glass

Stress control in masking layers for deep wet micromachining of Pyrex glass

10.1016/j.sna.2004.03.004

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Bibliographic Details
Main Authors: Iliescu, C., Miao, J., Tay, F.E.H.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
Amorphous silicon
Masking layer
Residual stress
Wet etching of glass
Online Access:http://scholarbank.nus.edu.sg/handle/10635/61382
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/61382

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